Nā huahana
Kalapona Tetrafluoride
ʻO Tetrafluoromethane, i ʻike ʻia ʻo carbon tetrafluoride, ʻo ia ka fluorocarbon maʻalahi loa (CF4). He kiʻekiʻe loa kona ikaika paʻa ma muli o ke ʻano o ka paʻa kalapona-fluorine. Hiki ke helu ʻia he haloalkane a i ʻole halomethane. Ma muli o ka nui o nā paʻa kalapona-fluorine, a me ka electronegativity kiʻekiʻe o ka fluorine, ke kalapona i loko o ka tetrafluoromethane he ʻāpana hapa maikaʻi koʻikoʻi e hoʻoikaika a hoʻopōkole i nā mea paʻa kalapona-fluorine ʻehā ma o ka hāʻawi ʻana i ke ʻano ionic hou. ʻO Tetrafluoromethane kahi kinoea hoʻomehana honua ikaika.
Hoʻohana ʻia ʻo Tetrafluoromethane i kekahi manawa ma ke ʻano he mea hoʻomehana wela haʻahaʻa. Hoʻohana ʻia ia i ka microfabrication uila wale nō a i hui pū ʻia me ka oxygen ma ke ʻano he etchant plasma no ke silika, silicon dioxide, a me ka silicon nitride.
| ʻO ke kimekema | CF4 | Kaumaha molekula | 88 |
| CAS No. | 75-73-0 | EINECS No. | 200-896-5 |
| Lae hehee | -184 ℃ | Lae boling | -128.1 ℃ |
| hikiwawe | ʻAʻole hiki ke hoʻonā i ka wai | ʻO ka mānoanoa | 1.96g/cm³ (-184 ℃) |
| Ka nana aku | He kinoea waihoʻoluʻu, ʻaʻala ʻole, ʻaʻole hiki ke hoʻā ʻia | Palapala noi | hoʻohana ʻia i ke kaʻina hana etching plasma no nā ʻāpana like ʻole, a hoʻohana pū ʻia e like me ke kinoea laser, refrigerant etc. |
| Helu DOT ID | UN1982 | DOT/IMO KA inoa hoʻouna: | ʻO Tetrafluoromethane, Kinea Hoʻopiʻi a i ʻole R14 |
| Papa Hazard DOT | Papa 2.2 |
| 'ikamu | Waiwai, papa I | Waiwai, papa II | Unite |
| Maemae | ≥99.999 | ≥99.9997 | % |
| O2 | ≤1.0 | ≤0.5 | ppmv |
| N2 | ≤4.0 | ≤1.0 | ppmv |
| CO | ≤0.1 | ≤0.1 | ppmv |
| CO2 | ≤1.0 | ≤0.5 | ppmv |
| SF6 | ≤0.8 | ≤0.2 | ppmv |
| ʻO nā fluorocarbons ʻē aʻe | ≤1.0 | ≤0.5 | ppmv |
| H2O | ≤1.0 | ≤0.5 | ppmv |
| H2 | ≤1.0 | —— | ppmv |
| ʻakika | ≤0.1 | ≤0.1 | ppmv |
| * ʻO nā fluorocarbons ʻē aʻe e pili ana iā C2F6、C3F8 | |||
Nā memo
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