
|
Item |
Technical Property |
||
|
High purity krypton GB/T5829-2006 |
Ultrapure krypton |
||
| Kr purity (volume fraction)/10-2≥ |
99.999 |
99.9995 |
99.9999 |
| Nitrogen (N2) content (volume fraction)/10-6≤ |
2 |
1.5 |
0.2 |
| Oxygen (O2) content (volume fraction)/10-6≤ |
1.5(O2+Ar) |
0.5(O2+Ar) |
0.1 |
| Argon (Ar) content (volume fraction)/10-6≤ |
0.05 |
||
| Hydrogen (H2) content (volume fraction)/10-6≤ |
0.5 |
0.2 |
0.05 |
| Carbon monoxide (CO) content (volume fraction)/10-6≤ |
0.3 |
0.1 |
0.05 |
| Carbon dioxide (CO2) content (volume fraction)/10-6≤ |
0.4 |
0.1 |
0.05 |
| Methane (CH4) content (volume fraction)/10-6≤ |
0.3 |
0.1 |
0.05 |
| Water (H2O) content (volume fraction)/10-6≤ |
2 |
1 |
0.2 |
| Xenon (Xe) content (volume fraction)/10-6≤ |
2 |
1 |
0.2 |
| Fluoride (CF4) content (volume fraction)/10-6≤ |
1 |
0.2 |
0.05 |
Application field: mainly used in semiconductor industry, electric vacuum industry, electric light source industry, as well as laser gas, medical health and other fields