
| item | Teknikal na Ari-arian | ||
| Mataas na kadalisayan ng krypton GB/T5829-2006 | Ultrapure krypton | ||
| Kr kadalisayan (volume fraction)/10-2≥ | 99.999 | 99.9995 | 99.9999 |
| Nitrogen (N2) nilalaman (volume fraction)/10-6≤ | 2 | 1.5 | 0.2 |
| Oxygen (O2) nilalaman (volume fraction)/10-6≤ | 1.5(O2+Ar) | 0.5(O2+Ar) | 0.1 |
| Nilalaman ng Argon (Ar) (volume fraction)/10-6≤ | 0.05 | ||
| Hydrogen (H2) nilalaman (volume fraction)/10-6≤ | 0.5 | 0.2 | 0.05 |
| Nilalaman ng carbon monoxide (CO) (volume fraction)/10-6≤ | 0.3 | 0.1 | 0.05 |
| Carbon dioxide (CO2) nilalaman (volume fraction)/10-6≤ | 0.4 | 0.1 | 0.05 |
| Methane (CH4) nilalaman (volume fraction)/10-6≤ | 0.3 | 0.1 | 0.05 |
| Tubig (H2O) nilalaman (volume fraction)/10-6≤ | 2 | 1 | 0.2 |
| Xenon (Xe) content (volume fraction)/10-6≤ | 2 | 1 | 0.2 |
| Fluoride (CF4) nilalaman (volume fraction)/10-6≤ | 1 | 0.2 | 0.05 |
Larangan ng aplikasyon: pangunahing ginagamit sa industriya ng semiconductor, industriya ng electric vacuum, industriya ng electric light source, pati na rin ang laser gas, medikal na kalusugan at iba pang larangan